Silane gas is an indispensable material in the production of solar cells, and it is the most efficient way to attach silicon molecules to the cell surface. In addition to the photovoltaic industry, there are many industries that require silane gas, such as flat panel displays, semiconductors, and even the production of coated glass.
High-purity ammonia is mainly used in the field of new optoelectronic materials, and is an important basic material for the preparation of GAN by MOCVD technology. High-purity ammonia, silane, and high-purity argon are all used in the manufacture of thin-film solar cells.
Carbon tetrafluoride is the most widely used plasma etching gas in the microelectronics industry. It can be widely used in the etching of thin film materials such as silicon, silicon dioxide, silicon nitride, phosphosilicate glass and tungsten.
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