Ethylsilicate (TEOS) is used as the raw materials used in semiconductor technology deposition can be used for low pressure chemical vapor deposition (LPCVD) the surface of silica in SiC wafers deposits, ensure the density of the oxide layer medium and SiC wafers adhesion ability, improve the performance of the device and yield, and avoided in order to obtain a certain thickness of oxide layer of the shortcomings of long time high temperature oxidation.
TEOS is obtained by esterification of silicon tetrachloride and ethanol at normal temperature and pressure.
TEOS tained by adsorption, distillation and filtration. Jinhong has reached strategic cooperation with major semiconductor companies, and can supply more than 1,200 tons of electronic-grade TEOS every year.
Product | TEOS |
CAS No. | 78-10-4 |
Purity | ≥99.9% |
TEOS can be used for low pressure chemical vapor deposition (LPCVD) the surface of silica in SiC wafers deposits.
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