Octafluorocyclobutane has stable chemical properties, non-toxic and harmless, low global warming potential (GWP) value and zero ozone depletion index (ODP) value. It is a green and environmentally friendly special gas. Due to these good properties, octafluorocyclobutane has been widely used in technical fields such as high-voltage insulation, cleaning and etching, and plasma treatment in recent years.
Octafluorocyclobutane can be produced by the dimerization of tetrafluoroethylene through pyrolysis, quenching, filtration, compression, etc; Octafluorocyclobutane can also be obtained by electrolysis of tetrafluorocyclobutane in anhydrous Hydrogen fluoride. Contacting crude octafluorocyclobutane containing impurities with an impurity decomposing agent at a high temperature and then contacting an adsorbent can substantially remove impurities such as fluorocarbons and obtain high-purity octafluorocyclobutane.
Octafluorocyclobutane is also widely used in semiconductor etching surfaces. As a higher-level fluorocarbon plasma etching gas, it can be used in combination with lower-level fluorocarbons such as monofluoromethane and difluoromethane, which can greatly improve the etching effect.
Octafluorocyclobutane has a low GWP value (8900, only 37% of SF6), and the decomposition products under the action of arcs are fluorocarbons, which are non-toxic or low-toxic substances, and have a certain insulating arc extinguishing ability.
According to the chemical properties of octafluorocyclobutane, it can also be used as the main raw material for other chemical products.
Cylinder: 44L Valve: DISS716 Content: 50kg
Octafluorocyclobutane has a wide range of applications. In recent years, it has been widely used as a refrigerant to replace banned chlorofluorocarbons. In addition, it is also commonly used in gas insulation media, solvents, sprays, foaming agents, large-scale circuit etchant and others. High-purity octafluorocyclobutane (above 5N) is used as etchant and cleaning agent for VLSI.
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