The chemical formula of nitrogen trifluoride is NF₃. It is a colorless, odorless and stable gas at normal temperature. It is a strong oxidant. High purity nitrogen trifluoride has excellent etch rate and selectivity, and it is also a very good cleaning agent. Jinhong can provide you with high-purity nitrogen trifluoride gas to improve your semiconductor process.
Nitrogen trifluoride is prepared by the direct fluorination of ammonia. It may also be obtained by electrolysis of molten ammonium bifluoride or by direct combination of the elements nitrogen and fluorine using an electrical discharge at low temperatures.
Nitrogen trifluoride is used as a high speed, selective etchant in silicon processing. It has been used to etch silicon, polysilicon, silicon nitride and silicon oxide as well as refractory metals and silicides.
Nitrogen trifluoride is sometimes used as the fluorine source in HF /DF chemical lasers. Nitrogen trifluoride is used as a fluorinating agent. Nitrogen trifluoride is also used for fibre treatment.
Cylinder: 44L Valve: CGA640 Content: 20kg
Cylinder: 440L Valve: CGA640 Content: 200kg
ISO-20ft Valve: CGA640 Content: 4000kg
ISO-40ft Valve: CGA640 Content: 8000kg
ProcessPSA nitrogen generator is a nitrogen generation device based on Pressure Swing Adsorption (PSA) technology. It is primarily used to separate high-purity nitrogen from air and finds widespread applications in industries, laboratories, and medical fi...Learn More
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