Hexafluoroethane is a colorless, inflammable gas that is insoluble in water but soluble in ethanol. Its boiling point is -78.2°C, the melting point is -100.6°C, and its critical temperature is 19.7°C. Hexafluoroethane is generally used for plasma etching gas in the microelectronics industry, as well as device surface cleaning, optical fiber production, and low temperature refrigeration.
Hexafluoroethane is used for dry etching of silicon dioxide and for stripping photoresist.
Hexafluoroethane is used as a refrigerant in certain low temperature applications and as a component in some refrigerant blends.
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