The mixture of 80% CF4 gas with 20% O2 gas can be widely used in the surface cleaning of electronic components, solar cells, laser technology and other fields.
Blending
| Chemical Name | Oxygen | Tetrafluoromethane |
| CAS No. | 7782-44-7 | 75-73-0 |
| UN no. | 1956 | |
Signal word: Warning
The mixture gas of tetrafluoromethane and oxygen is widely used in silicon, silica, silicon, phosphorus silicon nitride thin film material such as glass and tungsten etching, in the production of electronic components surface cleaning, solar cells, laser technology, gas phase insulation, cryogenic refrigeration, leak inspection agent, attitude control space rockets, printed circuit also has a lot of use in the production of detergent, etc.
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